Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects / / A. Emre Yarimbiyik [and others]

• Pubblicazione: [Gaithersburg, MD] : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , [2006]
• Descrizione fisica: 1 online resource (21 unnumbered pages) : illustrations
• Soggetto topico: Nanoelectromechanical systems; Thin films - Size effects - Computer simulation
• Altri autori: AllenRicky BlackburnDavid L SchafftHarry A YarimbiyikA. Emre ZaghloulM. E (Mona Elwakkad)
• Note generali: "February 2006."; Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.; Title from page [1], viewed March 7, 2007.
• Nota di bibliografia: Includes bibliographical references.
• Titolo autorizzato: Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910709939003321
• Lo trovi qui: Univ. Federico II