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Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects
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Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects
ID:
3544980
Creatori:
(1388971) Schafft, Harry A.
...
(1410395) Blackburn, David L.
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(1419255) Zaghloul M. E (Mona Elwakkad)
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(1421995) Allen, Ricky
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(1421996) Yarimbiyik A. Emre
...
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