Nano-lithography / / edited by Stefan Landis

• Pubblicazione: London, : ISTE; Hoboken, N.J., : Wiley, 2011
• Edizione: 1st edition
• Descrizione fisica: 1 online resource (353 p.)
• Disciplina: 621.3815/31
• Soggetto topico: Nanolithography
• Altri autori: LandisStefan
• Note generali: "Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier"--t.p. verso.
• Nota di bibliografia: Includes bibliographical references and index.
• Nota di contenuto: Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.
• Sommario/riassunto: Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,
• Titolo autorizzato: Nano-lithography
• ISBN: 9781118621707; 1118621700; 9781118622582; 1118622588; 9781299315587; 1299315585; 9781118621622; 111862162X
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9911019632803321
• Lo trovi qui: Univ. Federico II
• Serie: ISTE