01225nam0 22002651i 450 UON0020471420231205103308.4420030730d1977 |0itac50 baspaCU|||| ||||| Constitucion de la Republica de CubaRepublica CubaLa Habanaeditado por el Departamento de Orientación del Comitè Central del Partito Comunista de Cuba1977. 92 p. ; 18 cm.dono prof. A. RiccioIT-UONSI Isp.A972/097CUBACostituzioneFontiUONC042850FICULa HabanaUONL001038342.7291Diritto costituzionale e amministrativo. Cuba21CUBA RepubblicaUONV122621681154Departamento de Orient. Revol. del Comité Central del Partido Com. de CubaUONV267439650ITSOL20240220RICASIBA - SISTEMA BIBLIOTECARIO DI ATENEOUONSIUON00204714SIBA - SISTEMA BIBLIOTECARIO DI ATENEOSI Isp.A 972 097 SI LO 61460 7 097 dono prof. A. RiccioBuonoConstitucion de la Republica de Cuba1257717UNIOR02766nam 2200661 a 450 991101963280332120200520144314.09781118621707111862170097811186225821118622588978129931558712993155859781118621622111862162X(CKB)2560000000100639(EBL)1143631(SSID)ssj0000833715(PQKBManifestationID)11442668(PQKBTitleCode)TC0000833715(PQKBWorkID)10936315(PQKB)11753188(MiAaPQ)EBC1143631(OCoLC)830161625(CaSebORM)9781118621707(OCoLC)876268808(OCoLC)ocn876268808(Perlego)1007213(EXLCZ)99256000000010063920101203d2011 uy 0engur|n|---|||||txtccrNano-lithography /edited by Stefan Landis1st editionLondon ISTE ;Hoboken, N.J. Wiley20111 online resource (353 p.)ISTE"Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier"--t.p. verso.9781848212114 1848212119 Includes bibliographical references and index.Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,ISTENanolithographyNanolithography.621.3815/31Landis Stefan1619512MiAaPQMiAaPQMiAaPQBOOK9911019632803321Nano-lithography4420613UNINA