LEADER 00968cam0-22002771i-450- 001 990006390130403321 005 19980601 035 $a000639013 035 $aFED01000639013 035 $a(Aleph)000639013FED01 035 $a000639013 100 $a19980601d1976----km-y0itay50------ba 101 0 $ager 102 $aCH 105 $ay---m---001yy 200 1 $a<>Strafen im schweizerischen Jugendstrafrecht$eunter besonderer Berucksichtigung der praxis in den Kanonen der Ostschweiz$e(Zürich, Glarus, Schaffhausen, Appenzell Ausserrhoden,Appenzell Innerrhoden, St. Gallen, Graubunden, Thurgau)$fChristoph Hug 210 $aZürich$cAku-Fotodruck$d1976 215 $aXX, 152 p.$d24 cm 700 1$aHug,$bChristoph$0240159 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990006390130403321 952 $aDISSERTAZIONE A 1749$b36215*$fFGBC 959 $aFGBC 996 $aStrafen im schweizerischen Jugendstrafrecht$9660578 997 $aUNINA LEADER 02766nam 2200661 a 450 001 9911019632803321 005 20200520144314.0 010 $a9781118621707 010 $a1118621700 010 $a9781118622582 010 $a1118622588 010 $a9781299315587 010 $a1299315585 010 $a9781118621622 010 $a111862162X 035 $a(CKB)2560000000100639 035 $a(EBL)1143631 035 $a(SSID)ssj0000833715 035 $a(PQKBManifestationID)11442668 035 $a(PQKBTitleCode)TC0000833715 035 $a(PQKBWorkID)10936315 035 $a(PQKB)11753188 035 $a(MiAaPQ)EBC1143631 035 $a(OCoLC)830161625 035 $a(CaSebORM)9781118621707 035 $a(OCoLC)876268808 035 $a(OCoLC)ocn876268808 035 $a(Perlego)1007213 035 $a(EXLCZ)992560000000100639 100 $a20101203d2011 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aNano-lithography /$fedited by Stefan Landis 205 $a1st edition 210 $aLondon $cISTE ;$aHoboken, N.J. $cWiley$d2011 215 $a1 online resource (353 p.) 225 1 $aISTE 300 $a"Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier"--t.p. verso. 311 08$a9781848212114 311 08$a1848212119 320 $aIncludes bibliographical references and index. 327 $aCh. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography. 330 $aLithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, 410 0$aISTE 606 $aNanolithography 615 0$aNanolithography. 676 $a621.3815/31 701 $aLandis$b Stefan$01619512 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911019632803321 996 $aNano-lithography$94420613 997 $aUNINA