1.

Record Nr.

UNINA9911019632803321

Titolo

Nano-lithography / / edited by Stefan Landis

Pubbl/distr/stampa

London, : ISTE

Hoboken, N.J., : Wiley, 2011

ISBN

9781118621707

1118621700

9781118622582

1118622588

9781299315587

1299315585

9781118621622

111862162X

Edizione

[1st edition]

Descrizione fisica

1 online resource (353 p.)

Collana

ISTE

Altri autori (Persone)

LandisStefan

Disciplina

621.3815/31

Soggetti

Nanolithography

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Note generali

"Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier"--t.p. verso.

Nota di bibliografia

Includes bibliographical references and index.

Nota di contenuto

Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.

Sommario/riassunto

Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers



and engineers have pushed the envelope of fields including optics, physics,