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| Titolo: |
Developments in surface contamination and cleaning [[electronic resource] ] : fundamentals and applied aspects . Volume 2 Particle deposition, control and removal / / edited by Rajiv Kohli and Kashmiri L. Mittal
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| Pubblicazione: | Amsterdam, : Elsevier, c2010 |
| Descrizione fisica: | 1 online resource (311 p.) |
| Disciplina: | 620.44 |
| Soggetto topico: | Cleaning |
| Coatings | |
| Dust control | |
| Particles - Measurement | |
| Surface contamination - Prevention | |
| Surfaces (Technology) | |
| Altri autori: |
KohliRajiv <1947->
MittalK. L. <1945->
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| Note generali: | Description based upon print version of record. |
| Nota di bibliografia: | Includes bibliographical references and index. |
| Nota di contenuto: | Front Cover; Developments in Surface Contaminationand Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1Particle Deposition onto Enclosure Surfaces; 1. INTRODUCTION; 2. BACKGROUND; 3. MECHANISMS OF PARTICLE TRANSPORT; 4. PARAMETERS FOR PARTICLE DEPOSITIONCHARACTERIZATION; 5. METHODS FOR MEASUREMENT OF PARTICLE DEPOSITION; 6. REVIEW OF EXPERIMENTAL STUDIES; 7. MODELING PARTICLE DEPOSITION AND THEEXPERIMENTAL VALIDATIONS; 8. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; Chapter 2Contamination Control: A Systems Approach; 1. INTRODUCTION; 2. A SYSTEMS APPROACH |
| 3. EFFECT OF CONTAMINATION CONTROL MEASURES ONRPN SCORES4. PITFALLS; 5. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 3Particles in Semiconductor Processing; 1. INTRODUCTION; 2. THEORY; 3. PARTICLE REMOVAL STUDY; 4. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 4Continuous Contamination Monitoring Systems; 1. INTRODUCTION; 2. CASE STUDIES OF TRADITIONAL VERSUS CRITICAL ANDBUSY SAMPLING FOR AIRBORNE PARTICLE COUNTS; 3. IN SITU PARTICLE MONITORING OF CLEANINGEQUIPMENT; 4. WHAT TO CONTINUOUSLY MONITOR IN HIGHTECHNOLOGYMANUFACTURING; REFERENCES | |
| Chapter 5Strippable Coatings for Removal of Surface Contaminants1. INTRODUCTION; 2. COATING DESCRIPTION; 3. TYPES OF STRIPPABLE COATINGS; 4. ISSUES WITH STRIPPABLE COATINGS; 5. PRECISION CLEANING APPLICATIONS; 6. SUMMARY; ACKNOWLEDGEMENTS; DISCLAIMER; REFERENCES; Chapter 6Ultrasonic Cleaning; 1. INTRODUCTION; 2. ULTRASONIC CLEANING; 3. PRINCIPLES OF ULTRASONIC CLEANING; 4. SURFACE CLEANLINESS MEASUREMENT; 5. THEORY OF ULTRASONIC CLEANING; 6. EXPERIMENTS IN SONIC CLEANING; 7. CLEANING OPTIMIZATION; ACKNOWLEDGEMENTS; REFERENCES; Index; ColorPlates | |
| Sommario/riassunto: | Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced modelsTypes of strippab |
| Altri titoli varianti: | Particle deposition, control and removal |
| Titolo autorizzato: | Developments in surface contamination and cleaning ![]() |
| ISBN: | 1-282-73820-8 |
| 9786612738203 | |
| 1-4377-7831-3 | |
| Formato: | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9911004777503321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |