LEADER 04125nam 2200613Ia 450 001 9911004777503321 005 20200520144314.0 010 $a1-282-73820-8 010 $a9786612738203 010 $a1-4377-7831-3 035 $a(CKB)2530000000000344 035 $a(EBL)631954 035 $a(OCoLC)700703767 035 $a(MiAaPQ)EBC631954 035 $a(EXLCZ)992530000000000344 100 $a20091118d2010 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 00$aDevelopments in surface contamination and cleaning$b[electronic resource] $efundamentals and applied aspects$hVolume 2$iParticle deposition, control and removal /$fedited by Rajiv Kohli and Kashmiri L. Mittal 210 $aAmsterdam $cElsevier$dc2010 215 $a1 online resource (311 p.) 300 $aDescription based upon print version of record. 311 $a1-4377-7830-5 320 $aIncludes bibliographical references and index. 327 $aFront Cover; Developments in Surface Contaminationand Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1Particle Deposition onto Enclosure Surfaces; 1. INTRODUCTION; 2. BACKGROUND; 3. MECHANISMS OF PARTICLE TRANSPORT; 4. PARAMETERS FOR PARTICLE DEPOSITIONCHARACTERIZATION; 5. METHODS FOR MEASUREMENT OF PARTICLE DEPOSITION; 6. REVIEW OF EXPERIMENTAL STUDIES; 7. MODELING PARTICLE DEPOSITION AND THEEXPERIMENTAL VALIDATIONS; 8. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; Chapter 2Contamination Control: A Systems Approach; 1. INTRODUCTION; 2. A SYSTEMS APPROACH 327 $a3. EFFECT OF CONTAMINATION CONTROL MEASURES ONRPN SCORES4. PITFALLS; 5. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 3Particles in Semiconductor Processing; 1. INTRODUCTION; 2. THEORY; 3. PARTICLE REMOVAL STUDY; 4. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 4Continuous Contamination Monitoring Systems; 1. INTRODUCTION; 2. CASE STUDIES OF TRADITIONAL VERSUS CRITICAL ANDBUSY SAMPLING FOR AIRBORNE PARTICLE COUNTS; 3. IN SITU PARTICLE MONITORING OF CLEANINGEQUIPMENT; 4. WHAT TO CONTINUOUSLY MONITOR IN HIGHTECHNOLOGYMANUFACTURING; REFERENCES 327 $aChapter 5Strippable Coatings for Removal of Surface Contaminants1. INTRODUCTION; 2. COATING DESCRIPTION; 3. TYPES OF STRIPPABLE COATINGS; 4. ISSUES WITH STRIPPABLE COATINGS; 5. PRECISION CLEANING APPLICATIONS; 6. SUMMARY; ACKNOWLEDGEMENTS; DISCLAIMER; REFERENCES; Chapter 6Ultrasonic Cleaning; 1. INTRODUCTION; 2. ULTRASONIC CLEANING; 3. PRINCIPLES OF ULTRASONIC CLEANING; 4. SURFACE CLEANLINESS MEASUREMENT; 5. THEORY OF ULTRASONIC CLEANING; 6. EXPERIMENTS IN SONIC CLEANING; 7. CLEANING OPTIMIZATION; ACKNOWLEDGEMENTS; REFERENCES; Index; ColorPlates 330 $aRajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced modelsTypes of strippab 517 3 $aParticle deposition, control and removal 606 $aCleaning 606 $aCoatings 606 $aDust control 606 $aParticles$xMeasurement 606 $aSurface contamination$xPrevention 606 $aSurfaces (Technology) 615 0$aCleaning. 615 0$aCoatings. 615 0$aDust control. 615 0$aParticles$xMeasurement. 615 0$aSurface contamination$xPrevention. 615 0$aSurfaces (Technology) 676 $a620.44 701 $aKohli$b Rajiv$f1947-$0312362 701 $aMittal$b K. L.$f1945-$0748276 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911004777503321 996 $aDevelopments in surface contamination and cleaning$94389126 997 $aUNINA