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Record Nr. |
UNINA9911004777503321 |
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Titolo |
Developments in surface contamination and cleaning [[electronic resource] ] : fundamentals and applied aspects . Volume 2 Particle deposition, control and removal / / edited by Rajiv Kohli and Kashmiri L. Mittal |
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Pubbl/distr/stampa |
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Amsterdam, : Elsevier, c2010 |
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ISBN |
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1-282-73820-8 |
9786612738203 |
1-4377-7831-3 |
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Descrizione fisica |
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1 online resource (311 p.) |
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Altri autori (Persone) |
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KohliRajiv <1947-> |
MittalK. L. <1945-> |
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Disciplina |
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Soggetti |
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Cleaning |
Coatings |
Dust control |
Particles - Measurement |
Surface contamination - Prevention |
Surfaces (Technology) |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Front Cover; Developments in Surface Contaminationand Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1Particle Deposition onto Enclosure Surfaces; 1. INTRODUCTION; 2. BACKGROUND; 3. MECHANISMS OF PARTICLE TRANSPORT; 4. PARAMETERS FOR PARTICLE DEPOSITIONCHARACTERIZATION; 5. METHODS FOR MEASUREMENT OF PARTICLE DEPOSITION; 6. REVIEW OF EXPERIMENTAL STUDIES; 7. MODELING PARTICLE DEPOSITION AND THEEXPERIMENTAL VALIDATIONS; 8. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; Chapter 2Contamination Control: A Systems Approach; 1. INTRODUCTION; 2. A SYSTEMS APPROACH |
3. EFFECT OF CONTAMINATION CONTROL MEASURES ONRPN SCORES4. PITFALLS; 5. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 3Particles in Semiconductor Processing; 1. INTRODUCTION; 2. |
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