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[null,"1.","Record Nr.",null,"UNINA9911004777503321"]
[null,null,"Titolo",null,"Developments in surface contamination and cleaning [[electronic resource] ] : fundamentals and applied aspects . Volume 2 Particle deposition, control and removal / / edited by Rajiv Kohli and Kashmiri L. Mittal"]
[null,null,"Pubbl/distr/stampa",null,"Amsterdam, : Elsevier, c2010"]
[null,null,"ISBN",null,"1-282-73820-8"]
[{"$nulls":4},"9786612738203"]
[{"$nulls":4},"1-4377-7831-3"]
[null,null,"Descrizione fisica",null,"1 online resource (311 p.)"]
[null,null,"Disciplina",null,"620.44"]
[null,null,"Soggetti",null,"Cleaning"]
[{"$nulls":4},"Coatings"]
[{"$nulls":4},"Dust control"]
[{"$nulls":4},"Particles - Measurement"]
[{"$nulls":4},"Surface contamination - Prevention"]
[{"$nulls":4},"Surfaces (Technology)"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Note generali","Description based upon print version of record."]
[null,null,null,"Nota di bibliografia","Includes bibliographical references and index."]
[null,null,"Nota di contenuto",null,"Front Cover; Developments in Surface Contaminationand Cleaning; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1Particle Deposition onto Enclosure Surfaces; 1. INTRODUCTION; 2. BACKGROUND; 3. MECHANISMS OF PARTICLE TRANSPORT; 4. PARAMETERS FOR PARTICLE DEPOSITIONCHARACTERIZATION; 5. METHODS FOR MEASUREMENT OF PARTICLE DEPOSITION; 6. REVIEW OF EXPERIMENTAL STUDIES; 7. MODELING PARTICLE DEPOSITION AND THEEXPERIMENTAL VALIDATIONS; 8. SUMMARY; ACKNOWLEDGEMENTS; REFERENCES; Chapter 2Contamination Control: A Systems Approach; 1. INTRODUCTION; 2. A SYSTEMS APPROACH"]
[{"$nulls":4},"3. EFFECT OF CONTAMINATION CONTROL MEASURES ONRPN SCORES4. PITFALLS; 5. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 3Particles in Semiconductor Processing; 1. INTRODUCTION; 2. THEORY; 3. PARTICLE REMOVAL STUDY; 4. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; Chapter 4Continuous Contamination Monitoring Systems; 1. INTRODUCTION; 2. CASE STUDIES OF TRADITIONAL VERSUS CRITICAL ANDBUSY SAMPLING FOR "]
[{"$nulls":4},"AIRBORNE PARTICLE COUNTS; 3. IN SITU PARTICLE MONITORING OF CLEANINGEQUIPMENT; 4. WHAT TO CONTINUOUSLY MONITOR IN HIGHTECHNOLOGYMANUFACTURING; REFERENCES"]
[{"$nulls":4},"Chapter 5Strippable Coatings for Removal of Surface Contaminants1. INTRODUCTION; 2. COATING DESCRIPTION; 3. TYPES OF STRIPPABLE COATINGS; 4. ISSUES WITH STRIPPABLE COATINGS; 5. PRECISION CLEANING APPLICATIONS; 6. SUMMARY; ACKNOWLEDGEMENTS; DISCLAIMER; REFERENCES; Chapter 6Ultrasonic Cleaning; 1. INTRODUCTION; 2. ULTRASONIC CLEANING; 3. PRINCIPLES OF ULTRASONIC CLEANING; 4. SURFACE CLEANLINESS MEASUREMENT; 5. THEORY OF ULTRASONIC CLEANING; 6. EXPERIMENTS IN SONIC CLEANING; 7. CLEANING OPTIMIZATION; ACKNOWLEDGEMENTS; REFERENCES; Index; ColorPlates"]
[null,null,null,"Sommario/riassunto","Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination.   Topics covered include:    A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced modelsTypes of strippab"]