Journal of vacuum science and technology A

• Pubblicazione: Woodbury, N.Y. : , : Published for the American Vacuum Society by the American Institute of Physics, , 1983-
• Disciplina: 621
• Soggetto topico: Vacuum technology; Surfaces (Physics); Surface chemistry; Thin films
• Soggetto genere / forma: Periodicals
• ISSN: 1520-8559
• Note generali: Title from PDF of issue table of contents (AIP, viewed Nov. 9, 2006).; Refereed/Peer-reviewed
• Sommario/riassunto: "Journal of Vacuum Science &Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science,thin-film materials science, and vacuum science and technology."; "Coverage: Applied and fundamental surface science; atomic layer deposition; electronic and photonic materials and their processing; magnetic thin films and interfaces; materials and thin films for energy conversion and storage; photovoltaics including thin-film and organic; plasma science and technology including plasma-surface interactions,diagnostics, deposition, and etching; applications of plasmas to micro- and nanoelectronics; surface engineering; thin-film deposition, etching, properties, and characterization; TEM; in-situ TEM; tribology; vacuum science and technology."
• Titolo autorizzato: Journal of vacuum science and technology A
• Formato: Materiale a stampa
• Livello bibliografico: Periodico
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910144566803321
• Lo trovi qui: Univ. Federico II