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[null,"1.","Record Nr.",null,"UNINA9910144566803321"]
[null,null,"Titolo",null,"Journal of vacuum science and technology A"]
[null,null,"Pubbl/distr/stampa",null,"Woodbury, N.Y. : , : Published for the American Vacuum Society by the American Institute of Physics, , 1983-"]
[null,null,"ISSN",null,"1520-8559"]
[null,null,"Disciplina",null,"621"]
[null,null,"Soggetti",null,"Vacuum technology"]
[{"$nulls":4},"Surfaces (Physics)"]
[{"$nulls":4},"Surface chemistry"]
[{"$nulls":4},"Thin films"]
[{"$nulls":4},"Periodicals"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[{"$nulls":3},"Livello bibliografico","Periodico"]
[{"$nulls":3},"Note generali","Title from PDF of issue table of contents (AIP, viewed Nov. 9, 2006)."]
[{"$nulls":4},"Refereed/Peer-reviewed"]
[{"$nulls":3},"Sommario/riassunto","\"Journal of Vacuum Science &Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science,thin-film materials science, and vacuum science and technology.\""]
[{"$nulls":4},"\"Coverage: Applied and fundamental surface science; atomic layer deposition; electronic and photonic materials and their processing; magnetic thin films and interfaces; materials and thin films for energy conversion and storage; photovoltaics including thin-film and organic; plasma science and technology including plasma-surface interactions,diagnostics, deposition, and etching; applications of plasmas to micro- and nanoelectronics; surface engineering; thin-film deposition, etching, properties, and characterization; TEM; in-situ TEM; tribology; vacuum science and technology.\""]