Physical Design and Mask Synthesis for Directed Self-Assembly Lithography / / by Seongbo Shim, Youngsoo Shin
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| Autore: |
Shim Seongbo
|
| Titolo: |
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography / / by Seongbo Shim, Youngsoo Shin
|
| Pubblicazione: | Cham : , : Springer International Publishing : , : Imprint : Springer, , 2018 |
| Edizione: | 1st ed. 2018. |
| Descrizione fisica: | 1 online resource (XIV, 138 p. 92 illus., 54 illus. in color.) |
| Disciplina: | 620.115 |
| Soggetto topico: | Nanotechnology |
| Electronic circuits | |
| Optical materials | |
| Electronics - Materials | |
| Nanoscience | |
| Nanostructures | |
| Semiconductors | |
| Nanotechnology and Microengineering | |
| Circuits and Systems | |
| Optical and Electronic Materials | |
| Nanoscale Science and Technology | |
| Persona (resp. second.): | ShinYoungsoo |
| Nota di contenuto: | Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL. |
| Sommario/riassunto: | This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. |
| Titolo autorizzato: | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |
| ISBN: | 3-319-76294-X |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910298599203321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |
Serie:
NanoScience and Technology, . 1434-4904