1.

Record Nr.

UNINA9910298599203321

Autore

Shim Seongbo

Titolo

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography / / by Seongbo Shim, Youngsoo Shin

Pubbl/distr/stampa

Cham : , : Springer International Publishing : , : Imprint : Springer, , 2018

ISBN

3-319-76294-X

Edizione

[1st ed. 2018.]

Descrizione fisica

1 online resource (XIV, 138 p. 92 illus., 54 illus. in color.)

Collana

NanoScience and Technology, , 1434-4904

Disciplina

620.115

Soggetti

Nanotechnology

Electronic circuits

Optical materials

Electronics - Materials

Nanoscience

Nanostructures

Semiconductors

Nanotechnology and Microengineering

Circuits and Systems

Optical and Electronic Materials

Nanoscale Science and Technology

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Nota di contenuto

Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.

Sommario/riassunto

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.