Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
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| Autore: |
Romano Lucia
|
| Titolo: |
Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
|
| Pubblicazione: | Basel, Switzerland, : MDPI - Multidisciplinary Digital Publishing Institute, 2021 |
| Descrizione fisica: | 1 online resource (106 p.) |
| Soggetto topico: | History of engineering and technology |
| Soggetto non controllato: | Al2O3 nanotube |
| anisotropic dry etching | |
| antireflection | |
| atomic layer deposition | |
| black GaAs | |
| bulk Si etching | |
| catalyst | |
| catalyst encapsulation | |
| curved Si structure | |
| electroless deposition | |
| etching rate | |
| ethanol electrooxidation | |
| gold (Au) metal assisted chemical etching | |
| gold electroplating | |
| high aspect ratio nanostructures | |
| magnetically guided metal-assisted chemical etching | |
| metal assisted chemical etching | |
| metal-assisted chemical etching | |
| n/a | |
| Pd nanoparticles-assisted chemical etching | |
| photon recycling | |
| porous silicon | |
| silicon | |
| silicon cones | |
| transversal pores | |
| ultra-high aspect ratio | |
| X-ray diffractive optics | |
| X-ray grating interferometry | |
| zone plate | |
| Persona (resp. second.): | RomanoLucia |
| Sommario/riassunto: | Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale-nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications. |
| Titolo autorizzato: | Micro- and Nano-Fabrication by Metal Assisted Chemical Etching |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910557124603321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |