LEADER 03325nam 2200661z- 450 001 9910557124603321 005 20231214133239.0 035 $a(CKB)5400000000040808 035 $a(oapen)https://directory.doabooks.org/handle/20.500.12854/68292 035 $a(EXLCZ)995400000000040808 100 $a20202105d2021 |y 0 101 0 $aeng 135 $aurmn|---annan 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aMicro- and Nano-Fabrication by Metal Assisted Chemical Etching 210 $aBasel, Switzerland$cMDPI - Multidisciplinary Digital Publishing Institute$d2021 215 $a1 electronic resource (106 p.) 311 $a3-03943-845-X 311 $a3-03943-846-8 330 $aMetal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates?Si, Ge, poly-Si, GaAs, and SiC?and using different catalysts?Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale?nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications. 606 $aHistory of engineering & technology$2bicssc 610 $aporous silicon 610 $aPd nanoparticles-assisted chemical etching 610 $aetching rate 610 $aethanol electrooxidation 610 $aX-ray diffractive optics 610 $azone plate 610 $ahigh aspect ratio nanostructures 610 $ametal-assisted chemical etching 610 $aelectroless deposition 610 $aAl2O3 nanotube 610 $aultra-high aspect ratio 610 $agold (Au) metal assisted chemical etching 610 $aatomic layer deposition 610 $aanisotropic dry etching 610 $asilicon cones 610 $ametal assisted chemical etching 610 $atransversal pores 610 $aantireflection 610 $ablack GaAs 610 $aphoton recycling 610 $aX-ray grating interferometry 610 $acatalyst 610 $asilicon 610 $agold electroplating 610 $amagnetically guided metal-assisted chemical etching 610 $abulk Si etching 610 $acurved Si structure 610 $acatalyst encapsulation 615 7$aHistory of engineering & technology 700 $aRomano$b Lucia$4edt$01322889 702 $aRomano$b Lucia$4oth 906 $aBOOK 912 $a9910557124603321 996 $aMicro- and Nano-Fabrication by Metal Assisted Chemical Etching$93035223 997 $aUNINA