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[null,"1.","Record Nr.",null,"UNINA990003307130403321"]
[null,null,"Autore",null,"Boyle, Ted E."]
[null,null,"Titolo",null,"Brendan Behan / by Ted E. Boyle"]
[null,null,"Pubbl/distr/stampa",null,"New York : Twayne Publishers, 1969"]
[null,null,"Descrizione fisica",null,"150 p. ; 20 cm"]
[null,null,"Collana",null,"Twayne's English authors series - v 91"]
[null,null,"Disciplina",null,"823.9"]
[null,null,"Locazione",null,"DECLI"]
[null,null,"Collocazione",null,"823.9 BOY"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,"2.","Record Nr.",null,"UNINA990002745540403321"]
[null,null,"Autore",null,"Mazzilli, Beniamino"]
[null,null,"Titolo",null,"La durata delle imprese individuali : Contributo allo studio statistico della vita delle imprese"]
[null,null,"Pubbl/distr/stampa",null,"Bari, : Arti grafiche Cressati Alfredo, 1949"]
[null,null,"Descrizione fisica",null,"100 p."]
[null,null,"Collana",null,"Collana di studi economici e sociali / Camera di commercio industria e agricoltura di Bari, Ufficio Studi ; 1"]
[null,null,"Locazione",null,"ECA"]
[null,null,"Collocazione",null,"28-9-29-RA"]
[null,null,"Lingua di pubblicazione",null,"Italiano"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,"3.","Record Nr.",null,"UNINA9910557124603321"]
[null,null,"Autore",null,"Romano Lucia"]
[null,null,"Titolo",null,"Micro- and Nano-Fabrication by Metal Assisted Chemical Etching"]
[null,null,"Pubbl/distr/stampa",null,"Basel, Switzerland, : MDPI - Multidisciplinary Digital Publishing Institute, 2021"]
[null,null,"Descrizione fisica",null,"1 online resource (106 p.)"]
[null,null,"Soggetti",null,"History of engineering and technology"]
[null,null,"Lingua di pubblicazione",null,"Inglese"]
[null,null,"Formato",null,"Materiale a stampa"]
[null,null,null,"Livello bibliografico","Monografia"]
[null,null,null,"Sommario/riassunto","Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale-nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications."]