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| Autore: |
Chen Chia-Wei
|
| Titolo: |
Retroreflex ellipsometry for nonplanar surfaces/ / Chia-Wei Chen
|
| Pubblicazione: | Karlsruhe : , : KIT Scientific Publishing, , 2025 |
| Descrizione fisica: | 1 online resource |
| Soggetto topico: | Ellipsometry - Applications |
| Surfaces (Technology) - Measurement | |
| Optical measurements - Techniques | |
| Scientific apparatus and instruments - Design and construction | |
| Nota di bibliografia: | Includes bibliographical references (pages) and index. |
| Nota di contenuto: | Abstract Kurzfassung Acknowledgements Notation Acronyms Introduction Related work Polarized light and ellipsometry Retroreflex ellipsometry Measurement methods and uncertainty analysis for nonplanar surfaces Results and discussion Conclusion and outlook Bibliography Own publications List of Figures List of Tables. |
| Sommario/riassunto: | Conventional ellipsometry is limited to flat surfaces because precise alignment is required, making measurements on curved samples difficult and time-consuming. This work proposes retroreflex ellipsometry, which overcomes these geometric limitations by using a retroreflector to return light along the same path. The method enables accurate, nondestructive ellipsometric measurements on nonplanar surfaces, allowing the determination of angles of incidence, tilt, refractive index, and film thickness. Experimental results confirm high accuracy and show strong potential for inline and in-situ industrial quality control, including the characterization of freeform optics and complex-shaped surfaces. |
| Titolo autorizzato: | Retroreflex Ellipsometry for Nonplanar Surfaces ![]() |
| Formato: | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9911003678403321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |