A study on reactive ion etching of barium strontium titanate films using mixtures of argon (Ar), carbon tetrafluoride (CF4), and sulfur hexafluoride (SF6) / / Samuel G. Hirsch [and four others]
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| Autore: |
Hirsch Samuel G.
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| Titolo: |
A study on reactive ion etching of barium strontium titanate films using mixtures of argon (Ar), carbon tetrafluoride (CF4), and sulfur hexafluoride (SF6) / / Samuel G. Hirsch [and four others]
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| Pubblicazione: | Aberdeen Proving Ground, MD : , : Army Research Laboratory, , July 2014 |
| Descrizione fisica: | 1 online resource (iv, 7 pages) : illustrations |
| Soggetto topico: | Semiconductors - Etching |
| Varactors | |
| Note generali: | Title from title screen (viewed Sept. 29, 2015). |
| "July 2014." | |
| Nota di bibliografia: | Includes bibliographical references. |
| Altri titoli varianti: | Study on reactive ion etching of barium strontium titanate films using mixtures of argon |
| Titolo autorizzato: | A study on reactive ion etching of barium strontium titanate films using mixtures of argon (Ar), carbon tetrafluoride (CF4), and sulfur hexafluoride (SF6) |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910698628803321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |