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Plasma processing of materials : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council



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Titolo: Plasma processing of materials : scientific opportunities and technological challenges / / Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council Visualizza cluster
Pubblicazione: Washington, D.C., : National Academy Press, 1991
Edizione: 1st ed.
Descrizione fisica: 1 online resource (87 p.)
Disciplina: 621.044
Soggetto topico: Plasma engineering
Microelectronics - Materials - Effect of radiation on
Surfaces (Technology)
Note generali: Bibliographic Level Mode of Issuance: Monograph
Nota di contenuto: Plasma Processing of Materials: -- Copyright -- Preface -- Acknowledgments -- Contents -- 1 Summary, Findings, Conclusions, And Recommendations -- SUMMARY -- FINDINGS, CONCLUSIONS, AND RECOMMENDATIONS -- 2 Plasma Processing And Low-Energy Plasma Science -- CLASSIFICATION OF PLASMAS -- BRIEF HISTORY OF LOW-ENERGY PLASMA SCIENCE AND TECHNOLOGY -- INDUSTRIAL APPLICATIONS OF PLASMA PROCESSING OF MATERIALS -- INTERFACE BETWEEN BASIC PLASMA SCIENCE AND APPLICATIONS -- SCOPE OF THIS REPORT -- 3 Plasma Processing In The Electronics Industry -- MICROELECTRONICS FABRICATION -- PLASMA ETCHING -- Anisotropy -- Selectivity -- Uniformity -- Damage -- New Materials -- PLASMA DEPOSITION -- Planarization, Filling, and Interconnection -- Surface Modification -- New Materials -- PLASMA CLEANING -- LOW-PRESSURE PLASMA REACTOR TECHNOLOGY -- Single-Wafer Processing -- Process Control -- New Plasma Sources -- Magnetic Confinement -- Downstream Processing -- Modulated Processing -- Clustered Processing -- THERMAL PLASMA REACTOR TECHNOLOGY -- TOWARD FLEXIBLE MICROELECTRONICS MANUFACTURING -- FINDINGS AND CONCLUSIONS -- 4 Scientific Foundation of Plasma Processing -- SURFACE PROCESSES -- Theory and Simulation -- Experimental Studies -- Beam-Surface Experiments -- Ex Situ Analysis -- PLASMA GENERATION AND TRANSPORT -- Low-Pressure Plasma Modeling -- Analysis -- Fluid Simulations -- Particle-In-Cell and Kinetic Simulations -- Thermal Plasma Modeling -- Toward Cad Tools And Expert Systems -- Chemical Kinetics -- Multidimensional Modeling and Magnetic Effects -- Stability of Processing Plasmas -- Accuracy and Reliability of Numerical Simulation Methods -- Plasma Diagnostics -- Positive Ions and Neutrals -- Electron Density and Energy Distribution -- Fields -- Negative Ions -- Particulates -- Reference Reactors -- Data Base for Plasma Generation and Transport -- Present Status.
Needs -- Distribution of Information -- PLASMA-SURFACE INTERACTIONS -- Boundary Conditions -- Passive Surfaces -- Particulates -- Microstructure Evolution -- In Situ Analysis -- FUNDING FOR PLASMA PROCESSING RESEARCH -- Japanese Research -- French Research -- FINDINGS AND CONCLUSIONS -- 5 Educational Issues -- EDUCATIONAL REQUIREMENTS FOR UNDERGRADUATES -- Laboratory Courses and the Scientific Method -- Research Experiences and Cooperative Programs -- U.S. GRADUATE EDUCATION -- TEXTS AND COMPUTER-AIDED INSTRUCTION -- FACULTY DEVELOPMENT -- CONTINUING EDUCATION -- FOREIGN EDUCATIONAL OFFERINGS -- Japan -- France -- FINDINGS AND CONCLUSIONS -- Appendix Participants in Workshop on Plasma Processing of Materials.
Titolo autorizzato: Plasma processing of materials  Visualizza cluster
ISBN: 1-280-20336-6
9786610203369
0-309-58375-6
0-585-08463-7
Formato: Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione: Inglese
Record Nr.: 9910817008203321
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