04505nam 2200589 a 450 991081700820332120240416233711.01-280-20336-697866102033690-309-58375-60-585-08463-7(CKB)110986584751116(OCoLC)43475627(CaPaEBR)ebrary10055392(SSID)ssj0000222460(PQKBManifestationID)11175776(PQKBTitleCode)TC0000222460(PQKBWorkID)10169814(PQKB)11765997(MiAaPQ)EBC3376299(Au-PeEL)EBL3376299(CaPaEBR)ebr10055392(OCoLC)923262698(EXLCZ)9911098658475111619911004d1991 uy 0engurcn|||||||||txtccrPlasma processing of materials scientific opportunities and technological challenges /Panel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council1st ed.Washington, D.C. National Academy Press19911 online resource (87 p.) Bibliographic Level Mode of Issuance: Monograph0-309-04597-5 Plasma Processing of Materials: -- Copyright -- Preface -- Acknowledgments -- Contents -- 1 Summary, Findings, Conclusions, And Recommendations -- SUMMARY -- FINDINGS, CONCLUSIONS, AND RECOMMENDATIONS -- 2 Plasma Processing And Low-Energy Plasma Science -- CLASSIFICATION OF PLASMAS -- BRIEF HISTORY OF LOW-ENERGY PLASMA SCIENCE AND TECHNOLOGY -- INDUSTRIAL APPLICATIONS OF PLASMA PROCESSING OF MATERIALS -- INTERFACE BETWEEN BASIC PLASMA SCIENCE AND APPLICATIONS -- SCOPE OF THIS REPORT -- 3 Plasma Processing In The Electronics Industry -- MICROELECTRONICS FABRICATION -- PLASMA ETCHING -- Anisotropy -- Selectivity -- Uniformity -- Damage -- New Materials -- PLASMA DEPOSITION -- Planarization, Filling, and Interconnection -- Surface Modification -- New Materials -- PLASMA CLEANING -- LOW-PRESSURE PLASMA REACTOR TECHNOLOGY -- Single-Wafer Processing -- Process Control -- New Plasma Sources -- Magnetic Confinement -- Downstream Processing -- Modulated Processing -- Clustered Processing -- THERMAL PLASMA REACTOR TECHNOLOGY -- TOWARD FLEXIBLE MICROELECTRONICS MANUFACTURING -- FINDINGS AND CONCLUSIONS -- 4 Scientific Foundation of Plasma Processing -- SURFACE PROCESSES -- Theory and Simulation -- Experimental Studies -- Beam-Surface Experiments -- Ex Situ Analysis -- PLASMA GENERATION AND TRANSPORT -- Low-Pressure Plasma Modeling -- Analysis -- Fluid Simulations -- Particle-In-Cell and Kinetic Simulations -- Thermal Plasma Modeling -- Toward Cad Tools And Expert Systems -- Chemical Kinetics -- Multidimensional Modeling and Magnetic Effects -- Stability of Processing Plasmas -- Accuracy and Reliability of Numerical Simulation Methods -- Plasma Diagnostics -- Positive Ions and Neutrals -- Electron Density and Energy Distribution -- Fields -- Negative Ions -- Particulates -- Reference Reactors -- Data Base for Plasma Generation and Transport -- Present Status.Needs -- Distribution of Information -- PLASMA-SURFACE INTERACTIONS -- Boundary Conditions -- Passive Surfaces -- Particulates -- Microstructure Evolution -- In Situ Analysis -- FUNDING FOR PLASMA PROCESSING RESEARCH -- Japanese Research -- French Research -- FINDINGS AND CONCLUSIONS -- 5 Educational Issues -- EDUCATIONAL REQUIREMENTS FOR UNDERGRADUATES -- Laboratory Courses and the Scientific Method -- Research Experiences and Cooperative Programs -- U.S. GRADUATE EDUCATION -- TEXTS AND COMPUTER-AIDED INSTRUCTION -- FACULTY DEVELOPMENT -- CONTINUING EDUCATION -- FOREIGN EDUCATIONAL OFFERINGS -- Japan -- France -- FINDINGS AND CONCLUSIONS -- Appendix Participants in Workshop on Plasma Processing of Materials.Plasma engineeringMicroelectronicsMaterialsEffect of radiation onSurfaces (Technology)Plasma engineering.MicroelectronicsMaterialsEffect of radiation on.Surfaces (Technology)621.044MiAaPQMiAaPQMiAaPQBOOK9910817008203321Plasma processing of materials3973929UNINA