Vai al contenuto principale della pagina
Titolo: | Journal of vacuum science and technology A |
Pubblicazione: | Woodbury, N.Y. : , : Published for the American Vacuum Society by the American Institute of Physics, , 1983- |
Disciplina: | 621 |
Soggetto topico: | Vacuum technology |
Surfaces (Physics) | |
Surface chemistry | |
Thin films | |
Soggetto genere / forma: | Periodicals |
ISSN: | 1520-8559 |
Note generali: | Title from PDF of issue table of contents (AIP, viewed Nov. 9, 2006). |
Refereed/Peer-reviewed | |
Sommario/riassunto: | "Journal of Vacuum Science &Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science,thin-film materials science, and vacuum science and technology." |
"Coverage: Applied and fundamental surface science; atomic layer deposition; electronic and photonic materials and their processing; magnetic thin films and interfaces; materials and thin films for energy conversion and storage; photovoltaics including thin-film and organic; plasma science and technology including plasma-surface interactions,diagnostics, deposition, and etching; applications of plasmas to micro- and nanoelectronics; surface engineering; thin-film deposition, etching, properties, and characterization; TEM; in-situ TEM; tribology; vacuum science and technology." | |
Titolo autorizzato: | Journal of vacuum science and technology A |
Formato: | Materiale a stampa |
Livello bibliografico | Periodico |
Lingua di pubblicazione: | Inglese |
Record Nr.: | 996546670403316 |
Lo trovi qui: | Univ. di Salerno |
Opac: | Controlla la disponibilità qui |