02628nas 2200553 450 99654667040331620230627105731.01520-8559(OCoLC)37329463(CKB)954925535070(CONSER)sn 98004661(DE-599)ZDB1475424-1(EXLCZ)9995492553507019970721a19839999 uy aengurcnu|||||crdamediacrrdacarrierJournal of vacuum science and technology AWoodbury, N.Y. :Published for the American Vacuum Society by the American Institute of Physics,1983-Title from PDF of issue table of contents (AIP, viewed Nov. 9, 2006).Refereed/Peer-reviewed0734-2101 "Journal of Vacuum Science &Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science,thin-film materials science, and vacuum science and technology.""Coverage: Applied and fundamental surface science; atomic layer deposition; electronic and photonic materials and their processing; magnetic thin films and interfaces; materials and thin films for energy conversion and storage; photovoltaics including thin-film and organic; plasma science and technology including plasma-surface interactions,diagnostics, deposition, and etching; applications of plasmas to micro- and nanoelectronics; surface engineering; thin-film deposition, etching, properties, and characterization; TEM; in-situ TEM; tribology; vacuum science and technology."Vacuum technologyPeriodicalsSurfaces (Physics)PeriodicalsSurface chemistryPeriodicalsVacuum technologyPeriodicalslatnliSurfaces (Physics)PeriodicalslatnliSurface chemistryPeriodicalslatnliThin filmsPeriodicalsThin filmsPeriodicalslatnliPeriodicalslcgftVacuum technologySurfaces (Physics)Surface chemistryVacuum technologySurfaces (Physics)Surface chemistryThin filmsThin films621American Vacuum Society.American Institute of Physics.JOURNAL996546670403316Journal of vacuum science and technology A3392169UNISA