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Record Nr. |
UNISA996546670403316 |
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Titolo |
Journal of vacuum science and technology A |
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Pubbl/distr/stampa |
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Woodbury, N.Y. : , : Published for the American Vacuum Society by the American Institute of Physics, , 1983- |
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ISSN |
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Disciplina |
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Soggetti |
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Vacuum technology |
Surfaces (Physics) |
Surface chemistry |
Thin films |
Periodicals |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Periodico |
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Note generali |
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Title from PDF of issue table of contents (AIP, viewed Nov. 9, 2006). |
Refereed/Peer-reviewed |
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Sommario/riassunto |
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"Journal of Vacuum Science &Technology A has a scope that is focused on the understanding of interfaces and surfaces at a fundamental level and to advance state-of-the-art technological applications of surface science,thin-film materials science, and vacuum science and technology." |
"Coverage: Applied and fundamental surface science; atomic layer deposition; electronic and photonic materials and their processing; magnetic thin films and interfaces; materials and thin films for energy conversion and storage; photovoltaics including thin-film and organic; plasma science and technology including plasma-surface interactions,diagnostics, deposition, and etching; applications of plasmas to micro- and nanoelectronics; surface engineering; thin-film deposition, etching, properties, and characterization; TEM; in-situ TEM; tribology; vacuum science and technology." |
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