Pore characterization in low-k dielectric films using x-ray reflectivity [[electronic resource] ] : x-ray porosimetry / / Christopher L. Soles ... [and others]
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| Titolo: |
Pore characterization in low-k dielectric films using x-ray reflectivity [[electronic resource] ] : x-ray porosimetry / / Christopher L. Soles ... [and others]
|
| Pubblicazione: | [Gaithersburg, Md.] : , : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, , [2004] |
| Descrizione fisica: | 1 online resource (xiii, 58 pages) : illustrations |
| Soggetto topico: | Dielectric films |
| Porosity | |
| Altri autori: |
SolesChristopher L
|
| Note generali: | Title from title screen (viewed on May 3, 2007). |
| "June 2004." | |
| Nota di bibliografia: | Includes bibliographical references (pages 55-58). |
| Altri titoli varianti: | Pore characterization in low-k dielectric films using x-ray reflectivity |
| Titolo autorizzato: | Pore characterization in low-k dielectric films using x-ray reflectivity |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910699292203321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |
Serie:
NIST special publication ; ; 960-13.
NIST recommended practice guide.