LEADER 01691oam  2200445Ia 450 
001 9910699292203321
005 20230902161950.0
035   $a(CKB)5470000002400980
035   $a(OCoLC)124076434
035   $a(EXLCZ)995470000002400980
100   $a20070509d2004      ua             0
101 0 $aeng
135   $aurcn|||||||||
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 00$aPore characterization in low-k dielectric films using x-ray reflectivity$b[electronic resource] $ex-ray porosimetry /$fChristopher L. Soles ... [and others]
210  1$a[Gaithersburg, Md.] :$cU.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology,$d[2004]
215   $a1 online resource (xiii, 58 pages) $cillustrations
225 1 $aSpecial publication ;$v960-13
225 1 $aNIST recommended practice guide
300   $aTitle from title screen (viewed on May 3, 2007).
300   $a"June 2004."
320   $aIncludes bibliographical references (pages 55-58).
410  0$aNIST special publication ;$v960-13.
410  0$aNIST recommended practice guide.
517   $aPore characterization in low-k dielectric films using x-ray reflectivity 
606   $aDielectric films
606   $aPorosity
615  0$aDielectric films.
615  0$aPorosity.
701   $aSoles$b Christopher L$01402032
712 02$aNational Institute of Standards and Technology (U.S.)
801  0$bNBS
801  1$bNBS
801  2$bGPO
906   $aBOOK
912   $a9910699292203321
996   $aPore characterization in low-k dielectric films using x-ray reflectivity$93471647
997   $aUNINA