Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton [[electronic resource] /] / F. Semedy ... [and others]
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| Autore: |
Semendy Fred
|
| Titolo: |
Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton [[electronic resource] /] / F. Semedy ... [and others]
|
| Pubblicazione: | Adelphi, MD : , : Army Resarch Laboratory, , [2010] |
| Descrizione fisica: | 1 online resource (vi, 14 pages) : color illustrations |
| Soggetto topico: | Silicon nitride |
| Chemical vapor deposition | |
| Note generali: | Title from PDF title screen (viewed on Aug. 6, 2010). |
| "March 2010." | |
| Nota di bibliografia: | Includes bibliographical references (page 11). |
| Altri titoli varianti: | Characterization of multi temperature and multi RF chuck power grown silicon nitride films by plasma enhanced chemical vapor deposition and inductive coupled plasma vapor deposition |
| Titolo autorizzato: | Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910697126203321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |
Serie:
ARL-TR (Aberdeen Proving Ground, Md.) ; ; 5105.