1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA
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| Titolo: |
1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA
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| Pubblicazione: | [Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1997 |
| Disciplina: | 621.3815/2 |
| Soggetto topico: | Semiconductor wafers - Defects |
| Semiconductors - Effect of radiation on | |
| Plasma etching - Congresses | |
| Electrical & Computer Engineering | |
| Electrical Engineering | |
| Engineering & Applied Sciences | |
| Persona (resp. second.): | CheungKin P |
| NakamuraMoritaka | |
| GabrielCalvin T | |
| Note generali: | Bibliographic Level Mode of Issuance: Monograph |
| Titolo autorizzato: | 1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 996206561003316 |
| Lo trovi qui: | Univ. di Salerno |
| Opac: | Controlla la disponibilità qui |