01950oam 2200529zu 450 99620656100331620210807003510.0(CKB)111055184271200(SSID)ssj0000455103(PQKBManifestationID)12192155(PQKBTitleCode)TC0000455103(PQKBWorkID)10398743(PQKB)11533745(EXLCZ)9911105518427120020160829d1997 uy engtxtccr1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA[Place of publication not identified]Northern California Chapter of the American Vacuum Society1997Bibliographic Level Mode of Issuance: Monograph0-9651577-1-7 Semiconductor wafersDefectsCongressesSemiconductorsEffect of radiation onCongressesPlasma etchingCongressesElectrical & Computer EngineeringHILCCElectrical EngineeringHILCCEngineering & Applied SciencesHILCCSemiconductor wafersDefectsSemiconductorsEffect of radiation onPlasma etchingCongresses.Electrical & Computer EngineeringElectrical EngineeringEngineering & Applied Sciences621.3815/2Cheung Kin PNakamura MoritakaGabriel Calvin TAmerican Vacuum SocietyIEEE Electron Devices SocietyInternational Symposium on Plasma Process-Induced DamagePQKBBOOK9962065610033161997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA2501004UNISA