LEADER 01950oam  2200529zu 450 
001 996206561003316
005 20210807003510.0
035   $a(CKB)111055184271200
035   $a(SSID)ssj0000455103
035   $a(PQKBManifestationID)12192155
035   $a(PQKBTitleCode)TC0000455103
035   $a(PQKBWorkID)10398743
035   $a(PQKB)11533745
035   $a(EXLCZ)99111055184271200
100   $a20160829d1997      uy              
101 0 $aeng
181   $ctxt
182   $cc
183   $acr
200 10$a1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA
210 31$a[Place of publication not identified]$cNorthern California Chapter of the American Vacuum Society$d1997
300   $aBibliographic Level Mode of Issuance: Monograph
311   $a0-9651577-1-7 
606   $aSemiconductor wafers$xDefects$vCongresses
606   $aSemiconductors$xEffect of radiation on$vCongresses
606   $aPlasma etching$xCongresses
606   $aElectrical & Computer Engineering$2HILCC
606   $aElectrical Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
615  0$aSemiconductor wafers$xDefects
615  0$aSemiconductors$xEffect of radiation on
615  0$aPlasma etching$xCongresses.
615  7$aElectrical & Computer Engineering
615  7$aElectrical Engineering
615  7$aEngineering & Applied Sciences
676   $a621.3815/2
702   $aCheung$b Kin P
702   $aNakamura$b Moritaka
702   $aGabriel$b Calvin T
712 02$aAmerican Vacuum Society
712 02$aIEEE Electron Devices Society
712 12$aInternational Symposium on Plasma Process-Induced Damage
801  0$bPQKB
906   $aBOOK
912   $a996206561003316
996   $a1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA$92501004
997   $aUNISA