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| Titolo: |
Metallic oxynitride thin films by reactive sputtering and related deposition methods : processes, properties and applications / / edited by Filipe Vaz, Nicolas Martin & Martin Fenker
|
| Pubblicazione: | Sharjah, United Arab Emirates ; ; Oak Park, Illinois : , : Bentham Science Publishers, , [2013] |
| ©2013 | |
| Descrizione fisica: | 1 online resource (363 p.) |
| Disciplina: | 660.2815 |
| Soggetto topico: | Thin films |
| Metals | |
| Altri autori: |
VazFilipe
MartinNicolas
FenkerMartin
|
| Note generali: | Description based upon print version of record. |
| Nota di bibliografia: | Includes bibliographical references and indexes. |
| Nota di contenuto: | Cover; Title; Contents; About the Editors; Foreword; Preface; List of Contributors; Part 1; Chapter 01; Chapter 02; Chapter 03; Part 2; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Part 3; Chapter 09; Chapter 10; Chapter 11; Chapter 12; Author index; Subject index |
| Sommario/riassunto: | This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. |
| Titolo autorizzato: | Metallic oxynitride thin films by reactive sputtering and related deposition methods ![]() |
| ISBN: | 1-60805-156-0 |
| Formato: | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910815471203321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |