02203nam 2200541 450 991081547120332120230803030841.01-60805-156-0(CKB)2670000000400497(EBL)1310821(OCoLC)854975260(SSID)ssj0001163788(PQKBManifestationID)11654830(PQKBTitleCode)TC0001163788(PQKBWorkID)11163736(PQKB)11718435(MiAaPQ)EBC1310821(EXLCZ)99267000000040049720111102d2013 uy 0engur|n|---|||||txtccrMetallic oxynitride thin films by reactive sputtering and related deposition methods processes, properties and applications /edited by Filipe Vaz, Nicolas Martin & Martin FenkerSharjah, United Arab Emirates ;Oak Park, Illinois :Bentham Science Publishers,[2013]©20131 online resource (363 p.)Description based upon print version of record.1-60805-157-9 Includes bibliographical references and indexes.Cover; Title; Contents; About the Editors; Foreword; Preface; List of Contributors; Part 1; Chapter 01; Chapter 02; Chapter 03; Part 2; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Part 3; Chapter 09; Chapter 10; Chapter 11; Chapter 12; Author index; Subject indexThis e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes.Thin filmsMetalsThin films.Metals.660.2815Vaz Filipe1704764Martin Nicolas408923Fenker Martin1704765MiAaPQMiAaPQMiAaPQBOOK9910815471203321Metallic oxynitride thin films by reactive sputtering and related deposition methods4090981UNINA