Chemical vapour deposition : precursors, processes and applications / / edited by Anthony C. Jones, Michael L. Hitchman

• Pubblicazione: Cambridge, UK, : Royal Society of Chemistry, c2009
• Edizione: 1st ed.
• Descrizione fisica: 1 online resource (599 p.)
• Disciplina: 671.735
• Soggetto topico: Chemical vapor deposition; Vapor-plating
• Altri autori: JonesAnthony C HitchmanMichael L
• Note generali: Description based upon print version of record.
• Nota di bibliografia: Includes bibliographical references and index.
• Nota di contenuto: 9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582
• Sommario/riassunto: Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes
• Altri titoli varianti: Chemical vapor deposition
• Titolo autorizzato: Chemical vapour deposition
• ISBN: 9781621987031; 1621987035; 9781847558794; 1847558798
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9911006780603321
• Lo trovi qui: Univ. Federico II