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010   $a9781621987031
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100   $a20090617d2009      uy         0
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 00$aChemical vapour deposition $eprecursors, processes and applications /$fedited by Anthony C. Jones, Michael L. Hitchman
205   $a1st ed.
210   $aCambridge, UK $cRoyal Society of Chemistry$dc2009
215   $a1 online resource (599 p.)
300   $aDescription based upon print version of record.
311 08$a9780854044658 
311 08$a0854044655 
320   $aIncludes bibliographical references and index.
327   $a9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582
330   $aChemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes
517 3 $aChemical vapor deposition
606   $aChemical vapor deposition
606   $aVapor-plating
615  0$aChemical vapor deposition.
615  0$aVapor-plating.
676   $a671.735
701   $aJones$b Anthony C$0622070
701   $aHitchman$b Michael L$01823887
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9911006780603321
996   $aChemical vapour deposition$94390829
997   $aUNINA