02570nam 2200625Ia 450 991100678060332120200520144314.09781621987031162198703597818475587941847558798(CKB)1000000000791421(EBL)1185335(SSID)ssj0000379246(PQKBManifestationID)11300115(PQKBTitleCode)TC0000379246(PQKBWorkID)10356872(PQKB)11224184(MiAaPQ)EBC1185335(PPN)198471106(MiAaPQ)EBC7424125(Au-PeEL)EBL7424125(Perlego)787184(EXLCZ)99100000000079142120090617d2009 uy 0engur|n|---|||||txtccrChemical vapour deposition precursors, processes and applications /edited by Anthony C. Jones, Michael L. Hitchman1st ed.Cambridge, UK Royal Society of Chemistryc20091 online resource (599 p.)Description based upon print version of record.9780854044658 0854044655 Includes bibliographical references and index.9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thesChemical vapor depositionChemical vapor depositionVapor-platingChemical vapor deposition.Vapor-plating.671.735Jones Anthony C622070Hitchman Michael L1823887MiAaPQMiAaPQMiAaPQBOOK9911006780603321Chemical vapour deposition4390829UNINA