Advances in Chemical Vapor Deposition
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| Autore: |
Vernardou Dimitra
|
| Titolo: |
Advances in Chemical Vapor Deposition
|
| Pubblicazione: | Basel, Switzerland, : MDPI - Multidisciplinary Digital Publishing Institute, 2021 |
| Descrizione fisica: | 1 online resource (94 p.) |
| Soggetto topico: | Technology: general issues |
| Soggetto non controllato: | 2D |
| aerosol assisted CVD | |
| Al2O3 | |
| aluminum oxide | |
| aluminum tri-sec-butoxide | |
| ammonium metavanadate | |
| anatase single crystals | |
| APCVD | |
| atmospheric pressure CVD | |
| atomic layer deposition | |
| carbon nanotubes | |
| chemical vapor deposition | |
| competitive growth | |
| computational fluid dynamics | |
| CVD | |
| electrochromic | |
| electrochromism | |
| field emission | |
| hybrid CVD | |
| low pressure CVD | |
| performance optimization | |
| perovskite photovoltaic materials | |
| perovskite photovoltaic nanomaterials | |
| pp-MOCVD | |
| process-induced nanostructures | |
| processing parameters | |
| pulsed CVD | |
| residual gas adsorption | |
| residual gas desorption | |
| solar cells | |
| spray pyrolysis | |
| stabilization | |
| structural design | |
| thin film | |
| TiO2 | |
| V2O5 | |
| vanadium pentoxide | |
| VO2 | |
| Persona (resp. second.): | VernardouDimitra |
| Sommario/riassunto: | Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue "Advances in Chemical Vapor Deposition" is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices. |
| Titolo autorizzato: | Advances in Chemical Vapor Deposition |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910557748803321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |