03142nam 2200793z- 450 991055774880332120210501(CKB)5400000000045854(oapen)https://directory.doabooks.org/handle/20.500.12854/68301(oapen)doab68301(EXLCZ)99540000000004585420202105d2021 |y 0engurmn|---annantxtrdacontentcrdamediacrrdacarrierAdvances in Chemical Vapor DepositionBasel, SwitzerlandMDPI - Multidisciplinary Digital Publishing Institute20211 online resource (94 p.)3-03943-923-5 3-03943-924-3 Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue "Advances in Chemical Vapor Deposition" is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.Technology: general issuesbicssc2Daerosol assisted CVDAl2O3aluminum oxidealuminum tri-sec-butoxideammonium metavanadateanatase single crystalsAPCVDatmospheric pressure CVDatomic layer depositioncarbon nanotubeschemical vapor depositioncompetitive growthcomputational fluid dynamicsCVDelectrochromicelectrochromismfield emissionhybrid CVDlow pressure CVDperformance optimizationperovskite photovoltaic materialsperovskite photovoltaic nanomaterialspp-MOCVDprocess-induced nanostructuresprocessing parameterspulsed CVDresidual gas adsorptionresidual gas desorptionsolar cellsspray pyrolysisstabilizationstructural designthin filmTiO2V2O5vanadium pentoxideVO2Technology: general issuesVernardou Dimitraedt1278627Vernardou DimitraothBOOK9910557748803321Advances in Chemical Vapor Deposition3013623UNINA