03129nam 2200781z- 450 991055774880332120231214132832.0(CKB)5400000000045854(oapen)https://directory.doabooks.org/handle/20.500.12854/68301(EXLCZ)99540000000004585420202105d2021 |y 0engurmn|---annantxtrdacontentcrdamediacrrdacarrierAdvances in Chemical Vapor DepositionBasel, SwitzerlandMDPI - Multidisciplinary Digital Publishing Institute20211 electronic resource (94 p.)3-03943-923-5 3-03943-924-3 Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.Technology: general issuesbicsscAPCVDVO2processing parameters2Dchemical vapor depositionatomic layer depositionaluminum oxidealuminum tri-sec-butoxidethin filmcarbon nanotubesresidual gas adsorptionresidual gas desorptionfield emissionatmospheric pressure CVDlow pressure CVDhybrid CVDaerosol assisted CVDpulsed CVDperovskite photovoltaic nanomaterialsstabilizationstructural designperformance optimizationsolar cellsanatase single crystalsprocess-induced nanostructurescompetitive growthpp-MOCVDvanadium pentoxideelectrochromicspray pyrolysisammonium metavanadateCVDelectrochromismperovskite photovoltaic materialsTiO2Al2O3V2O5computational fluid dynamicsTechnology: general issuesVernardou Dimitraedt1278627Vernardou DimitraothBOOK9910557748803321Advances in Chemical Vapor Deposition3013623UNINA