LEADER 03142nam  2200793z- 450 
001 9910557748803321
005 20210501
035   $a(CKB)5400000000045854
035   $a(oapen)https://directory.doabooks.org/handle/20.500.12854/68301
035   $a(oapen)doab68301
035   $a(EXLCZ)995400000000045854
100   $a20202105d2021      |y         0
101 0 $aeng
135   $aurmn|---annan
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 00$aAdvances in Chemical Vapor Deposition
210   $aBasel, Switzerland$cMDPI - Multidisciplinary Digital Publishing Institute$d2021
215   $a1 online resource (94 p.)
311 08$a3-03943-923-5 
311 08$a3-03943-924-3 
330   $aPursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue "Advances in Chemical Vapor Deposition" is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.
606   $aTechnology: general issues$2bicssc
610   $a2D
610   $aaerosol assisted CVD
610   $aAl2O3
610   $aaluminum oxide
610   $aaluminum tri-sec-butoxide
610   $aammonium metavanadate
610   $aanatase single crystals
610   $aAPCVD
610   $aatmospheric pressure CVD
610   $aatomic layer deposition
610   $acarbon nanotubes
610   $achemical vapor deposition
610   $acompetitive growth
610   $acomputational fluid dynamics
610   $aCVD
610   $aelectrochromic
610   $aelectrochromism
610   $afield emission
610   $ahybrid CVD
610   $alow pressure CVD
610   $aperformance optimization
610   $aperovskite photovoltaic materials
610   $aperovskite photovoltaic nanomaterials
610   $app-MOCVD
610   $aprocess-induced nanostructures
610   $aprocessing parameters
610   $apulsed CVD
610   $aresidual gas adsorption
610   $aresidual gas desorption
610   $asolar cells
610   $aspray pyrolysis
610   $astabilization
610   $astructural design
610   $athin film
610   $aTiO2
610   $aV2O5
610   $avanadium pentoxide
610   $aVO2
615  7$aTechnology: general issues
700   $aVernardou$b Dimitra$4edt$01278627
702   $aVernardou$b Dimitra$4oth
906   $aBOOK
912   $a9910557748803321
996   $aAdvances in Chemical Vapor Deposition$93013623
997   $aUNINA