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High Cycle Fatigue of Al and Cu Thin Films by a Novel High-Throughput Method



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Autore: Burger Sofie Visualizza persona
Titolo: High Cycle Fatigue of Al and Cu Thin Films by a Novel High-Throughput Method Visualizza cluster
Pubblicazione: KIT Scientific Publishing, 2013
Descrizione fisica: 1 electronic resource (XII, 140 p. p.)
Soggetto non controllato: damage structure
Fatigue
thin film
cantilever bending
Sommario/riassunto: In the last two decades, the reliability of small electronic devices used in automotive or consumer electronics gained researchers attention. Thus, there is the need to understand the fatigue properties and damage mechanisms of thin films. In this thesis a novel high-throughput testing method for thin films on Si substrate is presented. The specialty of this method is to test one sample at different strain amplitudes at the same time and measure an entire lifetime curve with only one experiment.
Titolo autorizzato: High Cycle Fatigue of Al and Cu Thin Films by a Novel High-Throughput Method  Visualizza cluster
ISBN: 1000034759
Formato: Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione: Inglese
Record Nr.: 9910346703003321
Lo trovi qui: Univ. Federico II
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