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| Titolo: |
Effect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane (Dow-Corning 704) precursor on the properties of silicon containing diamond-like carbon (Si-DLC) coatings synthesized by ion-beam-assisted deposition (IBAD) [[electronic resource] /] / by C. G. Fountzoulas ... [and others]
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| Pubblicazione: | Aberdeen Proving Ground, MD : , : Army Research Laboratory, , [1999] |
| Descrizione fisica: | viii, 14 pages : digital, PDF file |
| Soggetto topico: | Surfaces (Technology) |
| Silicon | |
| Ion implantation | |
| Chemical bonds | |
| Altri autori: |
FountzoulasC. G (Constantine G.)
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| Note generali: | Title from title screen (viewed Feb. 26, 2009). |
| "May 1999." | |
| Nota di bibliografia: | Includes bibliographical references (page 9). |
| Altri titoli varianti: | Effect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane |
| Titolo autorizzato: | Effect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane (Dow-Corning 704) precursor on the properties of silicon containing diamond-like carbon (Si-DLC) coatings synthesized by ion-beam-assisted deposition (IBAD) ![]() |
| Formato: | Materiale a stampa |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910698062603321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |