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Effect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane (Dow-Corning 704) precursor on the properties of silicon containing diamond-like carbon (Si-DLC) coatings synthesized by ion-beam-assisted deposition (IBAD) [[electronic resource] /] / by C. G. Fountzoulas ... [and others]



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Titolo: Effect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane (Dow-Corning 704) precursor on the properties of silicon containing diamond-like carbon (Si-DLC) coatings synthesized by ion-beam-assisted deposition (IBAD) [[electronic resource] /] / by C. G. Fountzoulas ... [and others] Visualizza cluster
Pubblicazione: Aberdeen Proving Ground, MD : , : Army Research Laboratory, , [1999]
Descrizione fisica: viii, 14 pages : digital, PDF file
Soggetto topico: Surfaces (Technology)
Silicon
Ion implantation
Chemical bonds
Altri autori: FountzoulasC. G (Constantine G.)  
Note generali: Title from title screen (viewed Feb. 26, 2009).
"May 1999."
Nota di bibliografia: Includes bibliographical references (page 9).
Altri titoli varianti: Effect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane
Titolo autorizzato: Effect of the evaporation temperature of a tetraphenyl-tetramethyl-trisiloxane (Dow-Corning 704) precursor on the properties of silicon containing diamond-like carbon (Si-DLC) coatings synthesized by ion-beam-assisted deposition (IBAD)  Visualizza cluster
Formato: Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione: Inglese
Record Nr.: 9910698062603321
Lo trovi qui: Univ. Federico II
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