Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates [[electronic resource] ] : annual technical status report, 11 March 1998-11 March 1999 / / S.J. Jones ... [and others]
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| Titolo: |
Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates [[electronic resource] ] : annual technical status report, 11 March 1998-11 March 1999 / / S.J. Jones ... [and others]
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| Pubblicazione: | Golden, Colo. : , : National Renewable Energy Laboratory, , [1999] |
| Descrizione fisica: | 29 pages : digital, PDF file |
| Soggetto topico: | Photovoltaic cells - Research |
| Solar cells | |
| Thin films | |
| Plasma-enhanced chemical vapor deposition | |
| Altri autori: |
JonesS. J
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| Note generali: | Title from title screen (viewed June 20, 2008). |
| "September 1999." | |
| "Subcontractor report." | |
| Altri titoli varianti: | Use of very-high-frequency plasmas to prepare a-Si |
| Titolo autorizzato: | Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910696608903321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |