01641nam 2200433Ka 450 991069660890332120080620140051.0(CKB)5470000002380777(OCoLC)232361115(EXLCZ)99547000000238077720080620d1999 ua 0engtxtrdacontentcrdamediacrrdacarrierUse of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates[electronic resource] annual technical status report, 11 March 1998-11 March 1999 /S.J. Jones ... [and others]Golden, Colo. :National Renewable Energy Laboratory,[1999]29 pages digital, PDF fileNREL/SR ;520-26795Title from title screen (viewed June 20, 2008)."September 1999.""Subcontractor report."Use of very-high-frequency plasmas to prepare a-SiPhotovoltaic cellsResearchSolar cellsThin filmsPlasma-enhanced chemical vapor depositionPhotovoltaic cellsResearch.Solar cells.Thin films.Plasma-enhanced chemical vapor deposition.Jones S. J1396280National Renewable Energy Laboratory (U.S.)GPOGPOBOOK9910696608903321Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates3456087UNINA