Vai al contenuto principale della pagina
Titolo: | Metallic oxynitride thin films by reactive sputtering and related deposition methods : processes, properties and applications / / edited by Filipe Vaz, Nicolas Martin & Martin Fenker |
Pubblicazione: | Sharjah, United Arab Emirates ; ; Oak Park, Illinois : , : Bentham Science Publishers, , [2013] |
©2013 | |
Descrizione fisica: | 1 online resource (363 p.) |
Disciplina: | 660.2815 |
Soggetto topico: | Thin films |
Metals | |
Altri autori: | VazFilipe MartinNicolas FenkerMartin |
Note generali: | Description based upon print version of record. |
Nota di bibliografia: | Includes bibliographical references and indexes. |
Nota di contenuto: | Cover; Title; Contents; About the Editors; Foreword; Preface; List of Contributors; Part 1; Chapter 01; Chapter 02; Chapter 03; Part 2; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Part 3; Chapter 09; Chapter 10; Chapter 11; Chapter 12; Author index; Subject index |
Sommario/riassunto: | This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. |
Titolo autorizzato: | Metallic oxynitride thin films by reactive sputtering and related deposition methods |
ISBN: | 1-60805-156-0 |
Formato: | Materiale a stampa |
Livello bibliografico | Monografia |
Lingua di pubblicazione: | Inglese |
Record Nr.: | 9910815471203321 |
Lo trovi qui: | Univ. Federico II |
Opac: | Controlla la disponibilità qui |