Advances in Chemical Vapor Deposition
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| Autore: |
Vernardou Dimitra
|
| Titolo: |
Advances in Chemical Vapor Deposition
|
| Pubblicazione: | Basel, Switzerland, : MDPI - Multidisciplinary Digital Publishing Institute, 2021 |
| Descrizione fisica: | 1 electronic resource (94 p.) |
| Soggetto topico: | Technology: general issues |
| Soggetto non controllato: | APCVD |
| VO2 | |
| processing parameters | |
| 2D | |
| chemical vapor deposition | |
| atomic layer deposition | |
| aluminum oxide | |
| aluminum tri-sec-butoxide | |
| thin film | |
| carbon nanotubes | |
| residual gas adsorption | |
| residual gas desorption | |
| field emission | |
| atmospheric pressure CVD | |
| low pressure CVD | |
| hybrid CVD | |
| aerosol assisted CVD | |
| pulsed CVD | |
| perovskite photovoltaic nanomaterials | |
| stabilization | |
| structural design | |
| performance optimization | |
| solar cells | |
| anatase single crystals | |
| process-induced nanostructures | |
| competitive growth | |
| pp-MOCVD | |
| vanadium pentoxide | |
| electrochromic | |
| spray pyrolysis | |
| ammonium metavanadate | |
| CVD | |
| electrochromism | |
| perovskite photovoltaic materials | |
| TiO2 | |
| Al2O3 | |
| V2O5 | |
| computational fluid dynamics | |
| Persona (resp. second.): | VernardouDimitra |
| Sommario/riassunto: | Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices. |
| Titolo autorizzato: | Advances in Chemical Vapor Deposition |
| Formato: | Materiale a stampa  |
| Livello bibliografico | Monografia |
| Lingua di pubblicazione: | Inglese |
| Record Nr.: | 9910557748803321 |
| Lo trovi qui: | Univ. Federico II |
| Opac: | Controlla la disponibilità qui |