Recent advances in dielectric materials [[electronic resource] /] / Ai Huang, editor

• Pubblicazione: New York, : Nova Science Publishers, c2009
• Edizione: 1st ed.
• Descrizione fisica: 1 online resource (808 p.)
• Disciplina: 537/.24
• Soggetto topico: Dielectrics; Interconnects (Integrated circuit technology)
• Altri autori: HuangAi <1965->
• Note generali: Description based upon print version of record.
• Nota di bibliografia: Includes bibliographical references and index.
• Nota di contenuto: ""RECENT ADVANCES IN DIELECTRIC MATERIALS""; ""RECENT ADVANCES IN DIELECTRIC MATERIALS ""; ""CONTENTS""; ""PREFACE ""; ""LOW-K NANOPOROUS INTERDIELECTRICS:MATERIALS, THIN FILM FABRICATIONS,STRUCTURES AND PROPERTIES""; ""Abstract""; ""I. Introduction""; ""II. Recent Developments in Low-k Nanoporous Dielectrics""; ""III. Characterization of Pore Structures""; ""IV. Conclusions""; ""References""; ""DIELECTRIC MATERIALS: INTRODUCTION,RESEARCH AND APPLICATIONS""; ""Abstract""; ""1. Introduction""; ""2. Classification of Dielectrics""; ""3. History""; ""4. Dielectric Response of Materials"" ; ""5. Dielectric Spectroscopy""""6. Synthesis of Different Dielectric Materials""; ""7. Characterization Techniques""; ""8. Research on Some Dielectric Materials""; ""9. Complex Impedance Spectroscopy of Dielectric Materials""; ""10. Multiferroic Property of Dielectric Materials""; ""11. Applications""; ""12. Conclusion""; ""References""; ""UNDERSTANDING THE IMPACT OF HIGH-K GATE ANDSPACER DIELECTRICS ON THE DEVICE AND CIRCUITPERFORMANCE OF NANOSCALE MOSFETS""; ""Introduction""; ""1. Impact of High-K Gate Dielectric on Device Performance"" ; ""2. Impact of High-K Gate Dielectric on Circuit Performance""""3. Effect of High-K Spacers on Nanoscale CMOS Devices""; ""Summary""; ""References""; ""ORIENTATION SELECTIVITY CONTROL BY SURFACE POTENTIAL MODIFICATION IN OXIDE THIN FILM EPITAXIAL GROWTH""; ""Abstract""; ""1.Introduction""; ""2.Principle of OSE""; ""3.Experimental""; ""4.OSE by Substrate Bias Application""; ""5.Electron Beam Induced OSE""; ""6.Characterization of OSE Layers""; ""7.Conclusion""; ""Acknowledgements""; ""References""; ""UNUSUAL DIELECTRIC PROPERTIES OF CACUTIO""; ""Abstract""; ""1.Introduction"" ; ""2.Physical Properties""""3.Impurity Effects""; ""4.CCTO-Based Composites""; ""5.Related Oxides""; ""6.Concluding Remarks""; ""References""; ""DIELECTRIC RESPONSE METHODS FOR DIAGNOSTICS OF POWER TRANSFORMERS ""; ""Abstract ""; ""1. Introduction""; ""2. Insulating Materials Defined ""; ""3. Power Transformer Insulation""; ""4. Insulation Ageing ""; ""5. Condition Assessment of Power Transformer Insulation ""; ""6. Polarization Phenomena ""; ""7. Dielectric Spectroscopy Techniques ""; ""Conclusions ""; ""References "" ; ""SYMMETRY-INDUCED RESONANT TRANSMISSIONOF ELECTROMAGNETIC WAVES IN NON-PERIODICDIELECTRIC MICROSTRUCTURES""""Abstract""; ""1. Introduction""; ""II. Theoretical Analysis of Optical Propagation in AperiodicDielectric Multilayers with Internal Symmetry""; ""III. Optical Observation of Symmetric Fibonacci DielectricMultilayers""; ""IV. Resonant Transmission and Frequency Trifurcation of LightWaves in Thue-Morse Dielectric Multilayers""; ""V. Manipulation of Resonant Transmission of ElectromagneticWave by Tuning Nonperiodic Structure"" ; ""VI. Selectable-Frequency and Tunable-Q Perfect Transmissionsof Electromagnetic Waves in Dielectric Heterostructures""
• Titolo autorizzato: Recent advances in dielectric materials
• ISBN: 1-61668-270-1
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910824280403321
• Lo trovi qui: Univ. Federico II