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135   $aur|n|---|||||
181   $ctxt
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183   $acr
200 00$aRecent advances in dielectric materials$b[electronic resource] /$fAi Huang, editor
205   $a1st ed.
210   $aNew York $cNova Science Publishers$dc2009
215   $a1 online resource (808 p.)
300   $aDescription based upon print version of record.
311   $a1-60692-266-1 
320   $aIncludes bibliographical references and index.
327   $a""RECENT ADVANCES IN  DIELECTRIC MATERIALS""; ""RECENT ADVANCES IN  DIELECTRIC MATERIALS ""; ""CONTENTS""; ""PREFACE ""; ""LOW-K NANOPOROUS INTERDIELECTRICS:MATERIALS, THIN FILM FABRICATIONS,STRUCTURES AND PROPERTIES""; ""Abstract""; ""I. Introduction""; ""II. Recent Developments in Low-k Nanoporous Dielectrics""; ""III. Characterization of Pore Structures""; ""IV. Conclusions""; ""References""; ""DIELECTRIC MATERIALS: INTRODUCTION,RESEARCH AND APPLICATIONS""; ""Abstract""; ""1. Introduction""; ""2. Classification of Dielectrics""; ""3. History""; ""4. Dielectric Response of Materials""
327   $a""5. Dielectric Spectroscopy""""6. Synthesis of Different Dielectric Materials""; ""7. Characterization Techniques""; ""8. Research on Some Dielectric Materials""; ""9. Complex Impedance Spectroscopy of Dielectric Materials""; ""10. Multiferroic Property of Dielectric Materials""; ""11. Applications""; ""12. Conclusion""; ""References""; ""UNDERSTANDING THE IMPACT OF HIGH-K GATE ANDSPACER DIELECTRICS ON THE DEVICE AND CIRCUITPERFORMANCE OF NANOSCALE MOSFETS""; ""Introduction""; ""1. Impact of High-K Gate Dielectric on Device Performance""
327   $a""2. Impact of High-K Gate Dielectric on Circuit Performance""""3. Effect of High-K Spacers on Nanoscale CMOS Devices""; ""Summary""; ""References""; ""ORIENTATION SELECTIVITY CONTROL BY SURFACE POTENTIAL MODIFICATION IN OXIDE THIN FILM EPITAXIAL GROWTH""; ""Abstract""; ""1.Introduction""; ""2.Principle of OSE""; ""3.Experimental""; ""4.OSE by Substrate Bias Application""; ""5.Electron Beam Induced OSE""; ""6.Characterization of OSE Layers""; ""7.Conclusion""; ""Acknowledgements""; ""References""; ""UNUSUAL DIELECTRIC PROPERTIES OF CACUTIO""; ""Abstract""; ""1.Introduction""
327   $a""2.Physical Properties""""3.Impurity Effects""; ""4.CCTO-Based Composites""; ""5.Related Oxides""; ""6.Concluding Remarks""; ""References""; ""DIELECTRIC RESPONSE METHODS FOR DIAGNOSTICS OF POWER TRANSFORMERS ""; ""Abstract ""; ""1. Introduction""; ""2. Insulating Materials Defined ""; ""3. Power Transformer Insulation""; ""4. Insulation Ageing ""; ""5. Condition Assessment of Power Transformer Insulation ""; ""6. Polarization Phenomena ""; ""7. Dielectric Spectroscopy Techniques ""; ""Conclusions ""; ""References ""
327   $a""SYMMETRY-INDUCED RESONANT TRANSMISSIONOF ELECTROMAGNETIC WAVES IN NON-PERIODICDIELECTRIC MICROSTRUCTURES""""Abstract""; ""1. Introduction""; ""II. Theoretical Analysis of Optical Propagation in AperiodicDielectric Multilayers with Internal Symmetry""; ""III. Optical Observation of Symmetric Fibonacci DielectricMultilayers""; ""IV. Resonant Transmission and Frequency Trifurcation of LightWaves in Thue-Morse Dielectric Multilayers""; ""V. Manipulation of Resonant Transmission of ElectromagneticWave by Tuning Nonperiodic Structure""
327   $a""VI. Selectable-Frequency and Tunable-Q Perfect Transmissionsof Electromagnetic Waves in Dielectric Heterostructures""
606   $aDielectrics
606   $aInterconnects (Integrated circuit technology)
615  0$aDielectrics.
615  0$aInterconnects (Integrated circuit technology)
676   $a537/.24
701   $aHuang$b Ai$f1965-$01604789
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910824280403321
996   $aRecent advances in dielectric materials$93929759
997   $aUNINA