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Record Nr. |
UNINA9910824280403321 |
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Titolo |
Recent advances in dielectric materials [[electronic resource] /] / Ai Huang, editor |
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Pubbl/distr/stampa |
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New York, : Nova Science Publishers, c2009 |
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ISBN |
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Edizione |
[1st ed.] |
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Descrizione fisica |
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1 online resource (808 p.) |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Dielectrics |
Interconnects (Integrated circuit technology) |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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""RECENT ADVANCES IN DIELECTRIC MATERIALS""; ""RECENT ADVANCES IN DIELECTRIC MATERIALS ""; ""CONTENTS""; ""PREFACE ""; ""LOW-K NANOPOROUS INTERDIELECTRICS:MATERIALS, THIN FILM FABRICATIONS,STRUCTURES AND PROPERTIES""; ""Abstract""; ""I. Introduction""; ""II. Recent Developments in Low-k Nanoporous Dielectrics""; ""III. Characterization of Pore Structures""; ""IV. Conclusions""; ""References""; ""DIELECTRIC MATERIALS: INTRODUCTION,RESEARCH AND APPLICATIONS""; ""Abstract""; ""1. Introduction""; ""2. Classification of Dielectrics""; ""3. History""; ""4. Dielectric Response of Materials"" |
""5. Dielectric Spectroscopy""""6. Synthesis of Different Dielectric Materials""; ""7. Characterization Techniques""; ""8. Research on Some Dielectric Materials""; ""9. Complex Impedance Spectroscopy of Dielectric Materials""; ""10. Multiferroic Property of Dielectric Materials""; ""11. Applications""; ""12. Conclusion""; ""References""; ""UNDERSTANDING THE IMPACT OF HIGH-K GATE ANDSPACER DIELECTRICS ON THE DEVICE AND CIRCUITPERFORMANCE OF NANOSCALE MOSFETS""; ""Introduction""; ""1. Impact of High-K Gate Dielectric on Device Performance"" |
""2. Impact of High-K Gate Dielectric on Circuit Performance""""3. Effect of High-K Spacers on Nanoscale CMOS Devices""; ""Summary""; ""References""; ""ORIENTATION SELECTIVITY CONTROL BY SURFACE POTENTIAL MODIFICATION IN OXIDE THIN FILM EPITAXIAL GROWTH""; |
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