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Metallic oxynitride thin films by reactive sputtering and related deposition methods : processes, properties and applications / / edited by Filipe Vaz, Nicolas Martin & Martin Fenker



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Titolo: Metallic oxynitride thin films by reactive sputtering and related deposition methods : processes, properties and applications / / edited by Filipe Vaz, Nicolas Martin & Martin Fenker Visualizza cluster
Pubblicazione: Sharjah, United Arab Emirates ; ; Oak Park, Illinois : , : Bentham Science Publishers, , [2013]
©2013
Descrizione fisica: 1 online resource (363 p.)
Disciplina: 660.2815
Soggetto topico: Thin films
Metals
Altri autori: VazFilipe  
MartinNicolas  
FenkerMartin  
Note generali: Description based upon print version of record.
Nota di bibliografia: Includes bibliographical references and indexes.
Nota di contenuto: Cover; Title; Contents; About the Editors; Foreword; Preface; List of Contributors; Part 1; Chapter 01; Chapter 02; Chapter 03; Part 2; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Chapter 08; Part 3; Chapter 09; Chapter 10; Chapter 11; Chapter 12; Author index; Subject index
Sommario/riassunto: This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes.
Titolo autorizzato: Metallic oxynitride thin films by reactive sputtering and related deposition methods  Visualizza cluster
ISBN: 1-60805-156-0
Formato: Materiale a stampa
Livello bibliografico Monografia
Lingua di pubblicazione: Inglese
Record Nr.: 9910815471203321
Lo trovi qui: Univ. Federico II
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