Advanced nano deposition methods / / edited by Yuan Lin and Xin Chen

• Pubblicazione: Weinheim, Germany : , : Wiley-Vch Verlag GmbH & Co. KGaA : , : Chemical Industry Press, , 2016; ©2016
• Descrizione fisica: 1 online resource (329 p.)
• Disciplina: 620.5
• Soggetto topico: Nanostructured materials
• Altri autori: LinYuan (Of Dian zi ke ji da xue (Chengdu, China) ChenXin (Of Hua dong li gong da xue)
• Note generali: Description based upon print version of record
• Nota di bibliografia: Includes bibliographical references at the end of each chapters and index
• Nota di contenuto: Cover; Title Page; Copyright; Contents; List of Contributors; Chapter 1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure; 1.1 Introduction; 1.2 Pulsed Laser Deposition System Setup; 1.3 Advantages and Disadvantages of Pulsed Laser Deposition; 1.4 The Thermodynamics and Kinetics of Pulsed Laser Deposition; 1.4.1 Laser-Material Interactions; 1.4.2 Dynamics of the Plasma; 1.4.3 Nucleation and Growth of the Film on the Substrate Surface; 1.5 Monitoring of Growth Kinetics; 1.5.1 Introduction and RHEED Studies; 1.5.2 Growth Kinetics Studies by Surface X-ray Diffraction ; 1.6 Fundamental Parameters in Thin Film Growth1.6.1 Substrate Temperature; 1.6.2 Background Gas Pressure; 1.6.3 Laser Fluence and Ablation Area; 1.6.4 Target-Substrate Distance; 1.6.5 Post-Annealing; 1.6.6 Lattice Misfit; 1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth; 1.7.1 Pulsed Laser Deposition for Superconductor Thin Film; 1.7.2 Pulsed Laser Deposition for Ferroelectric Thin Films; 1.7.3 Pulsed Laser Deposition for Ferromagnetic Thin Film; 1.7.4 Pulsed Laser Deposition for Multiferroics Thin Film; 1.7.5 Interface Strain Engineering the Complex Oxide Thin Film ; 1.7.5.1 Thickness Effect1.7.5.2 Substrate Effect; 1.7.5.3 Post-Annealing; 1.8 Pulsed Laser Deposition for Nanostructure Growth; 1.8.1 Self-Assembled Nanoscale Structures; 1.8.2 Geometrically Ordered Arrays; 1.9 Variation of Pulsed Laser Deposition; 1.10 Conclusion; References; Chapter 2 Electron Beam Evaporation Deposition; 2.1 Introduction; 2.2 Electron Beam Evaporation System; 2.2.1 Heating Principle and Characters of Electron Beams; 2.2.1.1 Heating Principle of Electron Beams; 2.2.1.2 Characters of Electron Beams; 2.2.2 Equipments of Electron Beam Source ; 2.2.2.1 Filament and Electron Emission2.2.2.2 Electron Beam Control; 2.2.2.3 Power Supply, Crucibles, and Feed Systems; 2.2.2.4 Source Materials; 2.2.3 Application of Electron Beam Evaporation; 2.2.3.1 Cooling of Electron Beam Gun; 2.2.3.2 Evaporation of Source Materials by Electron Beam; 2.2.3.3 Vacuum Deposition Process of Electron Beam Evaporation; 2.2.3.4 Attention and Warning for Electron Beam Evaporation; 2.3 Characterization of Thin Film; 2.3.1 Surface Morphology by AFM; 2.3.2 Thickness Measurement by Spectroscopic Ellipsometry; 2.4 Summary; Acknowledgments; References ; Chapter 3 Nanostructures and Thin Films Deposited with Sputtering3.1 Introduction; 3.2 Nanostructures with Sputtering; 3.2.1 Oxide Nanostructures; 3.2.1.1 Needle-Shaped MoO3 Nanowires; 3.2.1.2 Bi2O3 Nanowires; 3.2.2 Nitride Nanostructures; 3.2.2.1 Graphitic-C3N4 Nanocone Array; 3.2.2.2 InAlN Nanorods; 3.3 Thin Films Deposited with Sputtering; 3.3.1 Metal Alloy Thin Films; 3.3.1.1 LaNi5 Alloy Thin Films; 3.3.1.2 Ni-Mn-In Alloy Thin Films; 3.3.2 Composite Metal Oxide Thin Films; 3.3.2.1 BiFeO3/BaTiO3 Bilayer Thin Films; 3.4 Summary; Acknowledgments; References ; Chapter 4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy
• Titolo autorizzato: Advanced nano deposition methods
• ISBN: 3-527-69647-4; 3-527-69645-8; 3-527-69640-7
• Formato: Materiale a stampa
• Livello bibliografico: Monografia
• Lingua di pubblicazione: Inglese
• Record Nr.: 9910677221603321
• Lo trovi qui: Univ. Federico II